ZEISS to exhibit EUV photomask solutions at SEMICON Korea

Zeiss Korea announced on the 10th that it will participate in 'SEMICON Korea 2025' to be held at COEX in Gangnam-gu, Seoul from the 19th to the 21st.



Zeiss is a global optics company headquartered in Germany that has been supplying core components and solutions for advanced semiconductor manufacturing equipment.



Zeiss's lithography optical module. [Photo = Zeiss Korea]



At SEMICON Korea, Zeiss Korea will showcase semiconductor solutions ranging from lithography optical lenses to photomasks, manufacturing processes, and semiconductor precision inspection.



In particular, it will highlight the 'Zeiss Ames EUV' solution, a photochemical extreme ultraviolet (EUV) photomask review platform. This solution can analyze images and automate data processing through the EUV autoanalysis software package. It will



also share the '3D Tomography Solution' that implements a three-dimensional image of a single layer produced with a focused ion beam (FIB) using a scanning electron microscope (SEM) module.



According to Zeiss, this equipment can help with semiconductor microfabrication as it can sample, analyze, measure and verify semiconductor patterns with nanometer accuracy.



Zeiss Korea plans to have a recruiter on site at the booth to introduce global recruitment and Korean talent recruitment. After the SEMICON event, Zeiss Open Day, a networking program for current engineers and job seekers in the semiconductor industry, will also be held.



Jeong Hyeon-seok, CEO of Zeiss Korea, said, "I hope many Korean customers will check out Zeiss solutions at SEMICON Korea," and "I hope that this opportunity will allow us to expand our cooperation opportunities with more customers."





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